Isabelle SERVIN is a research scientist at CEA-Leti, Grenoble (France). She has 20 years of experience in the development of lithograohy processes for microelectronics, both in industry and R&D. Since 2022, she is involved in the eco-innovation program, as sustainability advisor for Technological Silicon Platform. She revceived her PhD on polymer chemistry from University Pierre & Marie Curie (Paris, France) in 1998.
Semiconductor ecosystem is committed to reach carbon neutrality in 2050 to reduce greenhouse gases, preserve energy and water. Sustainability and user-toxicity have become of critical concerns in the microelectronics industry. Photolithography, as the major process of nanofabrication, typically requires high volumes of toxic chemicals within resist formulation, solvent and developer. In this context, alternative chemistries to current petroleum-derived photoresists are investigated to reduce environmental impacts. The LCA of water-based bio-sourced resists, as promising eco-friendly candidate is compared to conventional solvent-based processes.