Bio:

Philippe Rodriguez is a research engineer and laboratory manager at CEA-Leti in the Semiconductor Platforms Division.

He received his Ph.D. in 2007 from the University of Lyon 1 in Materials Chemistry for his work on metal organic vapor phase epitaxy growth of B(In)GaAs epilayers. From 2007 to 2009, he worked at the CNRS (French National Center for Scientific Research) developing deposition methods on structured substrates for process intensification applications. In 2009, he started his career at the CEA (French Alternative Energies and Atomic Energy Commission). First, he worked on the coating and fluidization of dense powders by fluidized bed metal-organic chemical vapor deposition for the development of new nuclear fuels (2009 - 2011). Then, he developed silica permeation barriers by magnetron sputtering for laser megajoule gas targets (2011 - 2013). Finally, he joined CEA-Leti in Oct. 2013. His research activity is mainly focused on advanced contact technologies for electronics and photonics applications. He develops contact metallization for advanced CMOS and photonics devices (Si, Ge(Sn), III-V and GaN materials) and also deals with surface preparation and interface modulation prior to metallization. He led the contact team at CEA-Leti between 2017 and 2020 and became head of the Advanced Materials Deposition Laboratory in February 2020. In Sept. 2022, he joined the Surface and Interface Science and Engineering Department and since Jan. 2023, he is in charge of the Laboratory of Wet Surface Preparation, Epitaxy and Thermal Treatment Processes.

He is the author and co-author of approximately 100 peer-reviewed journal articles, 115 international conference papers, 2 book chapters, and 15 patents.